Production of CdTe Semiconductor Thin Films by Electrodeposition Technique for Solar Cell Applications
Electro-deposited cadmium tellurite (CuTe) thin film was grown onto ITO-coated glass substrate for 120 seconds at the room temperature and a constant cathodic potential of -0.85 V. Deposition solution was prepared from cadmium chloride (CdCl2), sodium tellurite (Na2TeO3) and pure water. The pH value of the deposition solution was adjusted to 2.0 by adding HCl. The EDX analysis shows that the film has 52% Cd and 48% Te elemental compositions. Film thickness was found to be 140 nm. The CdTe thin film exhibits p-type semiconductor character, and has an energy bandgap of 1.47 eV.
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Dergacheva, M.B., Statsyuk, V.N., Fogel, L.A. (2005) Electrodeposition of CdTe from ammonia-chloride buffer electrolytes, Journal of Electroanalytical Chemistry, 579, 43-49. doi: 10.1016/j.jelechem.2004.12.040
Kim, S.H., Han, W.K., Lee, J.H. (2010) Electrochemical characterization of CdSe and CdTe thin films using cyclic voltammetry, Current Applied Physics, 10, S481-S483. doi: 10.1016/j.cap.2010.02.054
Nishio, T., Takahashi, M., Wada, S., Miyauchi, T., Wakita, K., Goto, H., Sato, S., Sakurada, O. (2008) Preparation and Characterization of Electrodeposited In-Doped CdTe Semiconductor Films, Electrical Engineering in Japan, 164(3), 12-17. doi: 10.1002/eej.20673
Osial, M., Widera, J., Jackowska, K. (2013) Influence of electrodeposition conditions on the properties of CdTe films, Journal of Solid State Electrochemistry, 17(9), 2477-2486. doi: 10.1007/s10008-013-2125-0
Shan, B., Wu, W., Feng, K., Nan, H. (2016) Electrodeposition of wurtzite CdTe and the potential dependence of the phase structure, Materials Letters, 166, 85-88. doi: 10.1016/j.matlet.2015.12.060
Tauc, J. (1974) Amorphous and Liquid Semiconductors, Plenum Press, Newyork, p.159.
Wang, J., Li, Q., Mu, Y., Li, S., Yang, L., Lv, P., Su, S., Liu, T., Fu, W., Yang, H. (2015) Fabrication of CdTe thin films grown by the two-step electrodeposition technique on Ni foils, Journal of Alloys and Compounds, 636, 97-101. doi: 10.1016/j.jallcom.2015.02.094
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